Difference between revisions of "MNC 2008"

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  | Acronym= MNC 2008
 
  | Acronym= MNC 2008
  | End date= 2008/10/30
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  | End date= 2008-10-30
 
  | Series=
 
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  | Type  = Conference
 
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  | State = JP/40
 
  | State = JP/40
 
  | City  = JP/40/Fukuoka
 
  | City  = JP/40/Fukuoka
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| Year  = 2008
 
  | Homepage= imnc.jp
 
  | Homepage= imnc.jp
  | Start date= 2008/10/27
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  | Start date= 2008-10-27
 
  | Title = 21st International Microprocesses and Nanotechnology Conference
 
  | Title = 21st International Microprocesses and Nanotechnology Conference
  | wikicfpId= 3216}}
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Latest revision as of 03:53, 6 December 2021


Event Rating

median worst
Pain3.svg Pain7.svg

List of all ratings can be found at MNC 2008/rating

MNC 2008
21st International Microprocesses and Nanotechnology Conference
Dates 2008-10-27 (iCal) - 2008-10-30
Homepage: imnc.jp
Location
Location: JP/40/Fukuoka, JP/40, JP
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Important dates
Submissions: Jun 30, 2008
Table of Contents


MNC 2008 SCOPE and SYMPOSIUM
1-1:DUV, VUV, EUV Lithography and Metrology
1-2:Electron- and Ion-Beam Lithography
1-3:Resist Materials and Processing
2-1:Nanodevices
2-2:Nanofabrication
2-3:Nanomaterials
2-4:Nano-Tool
3:Nanoimprint, Nanoprint and Rising Lithography
4:Bio MEMS, Lab on a Chip
5:Microsystem Technology and MEMS

Symposium A. Lithography Technology for 32nm node device
Symposium B. Sensor Applications of Micro- process and Nanotechnology
Symposium C. Nanoimprint Technology
		
Conference Site:
JAL Resort Sea Hawk Hotel Fukuoka, Japan

IMPORTANT DATE

Abstract Deadline:
June 30, 2008

Late News Paper :
September 1, 2008

Registration:
October , 2008

JJAP Proceeding
October 30, 2008
	

This CfP was obtained from WikiCFP